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Electrode potential, effect etch rate

FIGURE 7.10. Effect of etch rate on the electrode potentials of n- and p-type Si in HF-HNO3 mixtures. Rate of etching increased by adding HE to HNO3. After Turner." (Reproduced by permission of The Electrochemical Society, Inc.)... [Pg.292]

Power level Is set, determined by power density required during material-specific qualifying trial activity. Web speed, electrode width, number of sides treated, and power density directly determine the required station power (Watt). Supplying no more than the maximum rated number of Watts per foot (or meter) of electrode length prevents potential surface overtreatment effects, such as over-etching, and can prevent electrode over-heating. [Pg.92]


See other pages where Electrode potential, effect etch rate is mentioned: [Pg.245]    [Pg.92]    [Pg.241]    [Pg.423]    [Pg.403]    [Pg.215]    [Pg.302]    [Pg.80]    [Pg.1468]    [Pg.2768]    [Pg.881]    [Pg.65]    [Pg.130]    [Pg.298]    [Pg.285]    [Pg.432]    [Pg.101]    [Pg.47]   
See also in sourсe #XX -- [ Pg.293 , Pg.297 , Pg.302 , Pg.304 , Pg.308 ]




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Etching effect

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