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Electrochemical micromachining material

M. Malapati, A. Sarkar, B. Bhattacharyya, Frequency Pulse Period and Duty Factor Effects on Electrochemical Micromachining (EMM), Advanced Materials Research 264-265 (2011) 1334-1339. [Pg.142]

Electrochemical etching is one way of controlling the etch rate and determine a clear etch stop layer when bulk micromachining Silicon. In this case, the wafer is used as anode in an HF-Electrolyte. Sufficiently high currents lead to oxidation of the silicon. The resulting oxide which is dissolved by the HF-solution. Since lowly doped silicon material is not exhibiting a notable etch rate, it can be used as an etch stop. [Pg.204]

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See also in sourсe #XX -- [ Pg.167 ]



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