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Doping for Reduction of the Chemical Erosion Yield

Up to now mostly commercially available materials have been investigated. In the majority of cases they had been optimized for other purposes, such as the space program. Regarding their optimization for plasma-facing application, there is little flexibility in the fabrication procedure. Moreover, [Pg.219]

Recently, it could be demonstrated in the PISCES-B plasma simulator that Be impurity atoms in the eroding plasma can lead to a drastic suppression of chemical erosion already at concentrations as low as 0.15 at% [84], [Pg.221]


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Chemical erosion

Chemical reduction

Chemical yield

Doping chemically

Doping of

Reductive doping

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