DLC by PVD Processes from a Carbon Target

Ion-Beam Sputtering. The activation process for the deposition of a-C DLC is based on the well-established industrial process of ion-beam sputtering.h V l A solid carbon cathode, also known as the target, is the carbon source. The deposition mechanism is summarized as follows  

usually argon, exposed to a high voltage, becomes ionized and produces a low-pressure electric discharge (the glow discharge described in Ch. 13, Sec. 3.2). 

The sputtered carbon atoms are energetic and move across the vacuum chamber to be deposited on the substrate. The latter is placed so that it can intercept these atoms with maximum efficiency as shown in the deposition apparatus of Fig. 14.3. In this system, a second ion source bombards the substrate to enhance the deposition mechanism. 

Impacting gaseous ion moving surface atom in advantageous site 

Gaseous impurity atom sputtered away from surface 

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