Direct-Current Thermal Plasma CVD

A common DC glow discharge PACVD system may be varied by operating the plasma at higher pressures and powers at which a DC arc discharge between the electrodes can be produced. In 1988, Kurihara et al.t l first reported the use of the DC plasma arc-jet CVD method, in which 

The plasma jet can be cooled rapidly prior to impact on the substrate surface by mixing with a cold inert gas fed into an annular fixture. Gaseous boron or phosphorous compounds can be introduced into the gas feed for the deposition of doped semiconductor diamond, 

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