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Diffusion of defects

The surface diffusion of defects and adsorbates is of obvious importance in heterogeneous catalysis, as this process brings the reactants together. Understanding the dynamics of molecules on oxide surfaces is also a key step toward the realization of working molecular electronics. We note here that diffusion of Ob-vacs really means diffusion of Ob into the vacancy, which leaves another Ob-vac in the position vacated by the Ob- Similarly, diffusion of OHb occurs by diffusion of the H atom. [Pg.232]

The effects of transfer of atoms by tunneling may play an essential role in a number of phenomena involving the transfer of atoms and atomic groups in the condensed phase. One may expect that these effects may exist not only in the proton transfer reactions considered above but also in such processes as the diffusion of hydrogen atoms and other light ions (e.g., Li+) in liquids, tunnel inversion and isomerization in some molecules, quantum diffusion of defects and light atoms in the electrode at cathodic incorporation of the ions, ion transfer across the liquid/solid interface, and low-temperature chemical reactions. [Pg.142]

There are two other methods in which computers can be used to give information about defects in solids, often setting out from atomistic simulations or quantum mechanical foundations. Statistical methods, which can be applied to the generation of random walks, of relevance to diffusion of defects in solids or over surfaces, are well suited to a small computer. Similarly, the generation of patterns, such as the aggregation of atoms by diffusion, or superlattice arrays of defects, or defects formed by radiation damage, can be depicted visually, which leads to a better understanding of atomic processes. [Pg.67]

Frank and co-workers also examined the IR spectrum of this polymer as a function of temperature to understand more clearly the mechanism of thermal contraction (50). However, their investigations were concerned primarily with the intensity and position of the 73 cm band as a function of temperature from 14 K to the melting point. They concluded that the data of the 73 cm absorption correlated well with previous x-ray measurements for expansion along the a axis of the unit cell, and an infiection was observed at ca. 243 K. This temperature would correspond, according to Frank et al., to the temperature at which diffusion of defects into the crystal can occur. [Pg.103]

Real oxide films are typically nonstoichiometric due to an excess of metal ions or a deficiency of oxygen ions in the film and are often amorphous or nanocrystalline. In the presence of water, hydrated oxides or hydroxides often form, such as Al(OH)3 or AlOOH in the passive layer of Al and Fe203-H20 or y-FeOOH in the passive layer of Fe. Furthermore, the migration or diffusion of defects within the oxide leads to transport of ions within the film and to ion transfer reactions (ITRs) that take place at the oxide-electrolyte interface. Defect concentrations in passive films usually range from 10 to 10 cm [15]. Thus, as CPs are ion exchange polymers, ion transfer across CP-metal oxide interfaces is likely. [Pg.1630]

Diffusion of defects For a defect (an interstitial or a vacancy) that jumps from one site to another the equation for the diffusion coefficient was derived as... [Pg.377]

Figure 18.13 Stabilization of the domain wall position through interaction with charged defects, (a) The volume effect of charged dipole ordering along the spontaneous polarization (Pj) (b) The domain wall effect due to diffusion of defects to domain... Figure 18.13 Stabilization of the domain wall position through interaction with charged defects, (a) The volume effect of charged dipole ordering along the spontaneous polarization (Pj) (b) The domain wall effect due to diffusion of defects to domain...
A second key feature of the method is adaptive meshing,i.e., the ability to shift the location of the atomistic/continuum boundary and to refine or coarsen the continuum grid during a single simulation. This feature makes the QC method particularly suited for investigating phenomena such as the diffusion of defects. [Pg.297]

In the literature on diffusion and diffusion-controlled reactions or processes one encounters many different terms that describe the diffusional behaviour under different experimental conditions tracer and self-diffusion of atoms and ions, diffusion of defects, chemical diffusion, ambipolar diffusion, a.o. Many of these are used for treating diffusion in compounds, and in the following chapters these phenomena and terms will be described in more detail. Here we will start out with a few simple phenomenological descriptions, and for simplicity we look only at diffusion of neutral, independent particles. [Pg.106]

We now proceed by describing the diffusion of defects, and hence their contribution to conductivity in metal oxides. Pick s first law can be used to relate a diffusive flux to a concentration gradient. [Pg.67]

Reduced stabilized zireonia is black. As it oxidizes it become transparent. Following the propa tion of the front between the dark and transparent part in a single crystal b(0) has been determined. Instead of following the front, one can follow the integrated intensity changes due to diffusion of defects. This has been used to determine b(0) in SrTiOj doped with Fe impurities by following the absorption lines of the Fe ions. " The concentration of the optically active Fe ions increases at the expense of the Fe ions as the MIEC oxidizes. [Pg.259]

In the case of diffusion of defects in the solid state, these must be created at one of the interfaces (internal or external) and consumed at the other interfaee (external or internal). One of these two processes at least must also be aeeompanied by the growth of B, that is, the creation of building units of B. [Pg.311]

Basic mechanism ofgrowth with diffusions of defects... [Pg.473]

Table 13.5. Reactivity of growth from the mechanism with diffusion of defects in the formed solid... Table 13.5. Reactivity of growth from the mechanism with diffusion of defects in the formed solid...

See other pages where Diffusion of defects is mentioned: [Pg.766]    [Pg.287]    [Pg.247]    [Pg.83]    [Pg.172]    [Pg.591]    [Pg.184]    [Pg.36]    [Pg.224]    [Pg.87]    [Pg.19]    [Pg.194]    [Pg.225]    [Pg.597]    [Pg.143]    [Pg.232]    [Pg.231]    [Pg.769]    [Pg.230]    [Pg.1926]    [Pg.150]    [Pg.282]    [Pg.442]    [Pg.234]    [Pg.684]    [Pg.389]    [Pg.557]    [Pg.562]    [Pg.376]   
See also in sourсe #XX -- [ Pg.156 , Pg.215 ]

See also in sourсe #XX -- [ Pg.377 ]

See also in sourсe #XX -- [ Pg.297 ]




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Diffusion coefficient of defect

Diffusion of point defects

Diffusivity defects

Role of Defects in Solid State Diffusion Mechanisms

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