Diblock copolymer lithography

Several techniques have emerged for creating more ordered two- and three-dimensional assemblies of nanoparticles including Langmuir-Blodgett transfer, layer-by-layer assembly, and diblock copolymer lithography. These techniques are suitable for assembling MNPs with well-ordered nanostructures. A complete discussion of these techniques is beyond the scope of this chapter, but these topics have been extensively reviewed. ... 

Chang, C.-C. Botez, D. Wan, L. Nealey, P. F. Ruder, S. Kuech, T. F. Fabrication of large-area, high-density Ni nanopillar arrays on GaAs substrates using diblock copolymer lithography and electrodeposition. J. Vac. Sci. Technol. B 2013, 31, 031801-031805. 

Particularly in 2D systems, control over the self-assembly of colloidal templates has offered a versatile way to produce patterned surfaces or arrays with a precision of few nanometres. Diblock copolymer micellar nanolithography (dBCML) is a versatile method that uses homopolymers or block copolymers for the production of complex surface structures with nanosized features [69], In contrast to other approaches like electron-beam lithography (EBL) and photolithography, dBCML does not require extensive equipment. In fact, it is commonly used in the fabrication of data storage devices and photonic crystals, in catalyses [70], and for the design of mesoporous films and nanoparticle arrays [71]. 

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