Development resist technology

L First manufacturing use of chemically amplified resists Plasma-developed resist first described X-ray proximity lithography demonstrated Bis-azide rubber resists introduced DNO-novolac resist for microelectronics introduced Photoresist technology first applied to transistor fabrication DNO-novolac resist patented by Kalle... 

S mm and which, as indicated earlier, places strict limitations on the usefulness of the coating for protection against severely corrosive liquid environments. The value of rhodium in resisting atmospheric corrosion in environments ranging from domestic to marine and tropical exposure has, however, been amply demonstrated by experience, and it appears probable that further developments in technology may lead to still wider application. 

Other developments include the introduction of hybrid lines resistant to glyphosate and glufosinate. Glyphosate-resistance technology was rapidly adopted for soybean, but was more slowly adopted for field corn due to corn s slower canopy closure. Acceptance of glufosinate-resistant weed control technology faced the same obstacles, but has been even less competitive economically due to product cost. 

Unitika Textiles in Japan has also developed a technology to manufacture foam-moulded products with good heat resistance using PLA. 

There is research underway to produce compatibilized blends of kenaf and jute with polypropylene. This research is directed at developing the technologies needed to combine dissimilar resources for improved bonding, impact resistance, moldability, and to decrease creep. The two materials remain as separate phases, but if delamination and/or void formation can be avoided, properties can be improved over those of either separate phase. 

Multilayer resist technology offers a number of advantages in the generation of relief images but carries the burden of process complexity. We wish to report a novel process that greatly simplifies the optical MLR sequence. This concept is based on selective surface modification of the resist with a reactive dye which masks selected areas toward later flood exposure and solvent development. 

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