Defects Existing Before and Revealed After Polysilicon CMP

9 Defects Existing Before and Revealed After Polysilicon CMP 

The types of defects existing before polysilicon CMP are similar to the types of defects that can be observed before oxide CMP. The main difference is that the poly-Si film is not as transparent as an oxide film. The thicker the poly silicon film, the less transparent it is. 

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