Corrosion light elements

Ion scattering techniques are useful for characterizing corrosion layers. ISS provides information about the outermost monolayer. ERD (elastic recoil detection) is sensitive to light elements in a heavy matrix and thus provides useful H and Li profile information. Rutherford backscattering spectrometry (RBS), on the other hand,... 

Cihal and Prazak determined the resistance of 18/8 stainless steel to this type of corrosion. They claimed that the technique could be used on steels which are difficult to test by other methods, including steels of low carbon content, and steels in which stabilising elements are present. By means of potentiostatic curves and light etching at constant potential they confirmed that the extent of intergranular corrosion depended upon the amount of precipitated chromium carbide. 

This chapter provides general definitions of the defects present after CMP with specific examples and images whenever available. The likely causes for the defects are explained in light of formation mechanism whenever possible. In addition to the defects visible to optical and electron microscopes, such as scratches, corrosion [8,9], and particles, this chapter also deals with residues and nuisances that are not visible yet in some cases more important, such as metal contamination [10] on the wafer surface. For example, a trace of radioactive element left from a CMP [11] process would be detrimental to the transistor structures. At the same time, it is one of the least visible contaminations under conventional defect detection methods. 

---