Metal analysis contamination during

The primary sources of contamination in ion implantation come from metal atoms that may be etched off reactor fixtures, such as reactor wads, wafer holder, cHps, and so on. The pump oils used by the vacuum pumps may be a source of hydrocarbon contamination. The dopant sources themselves are not a significant source of contamination because unwanted ions are separated out from the beam during beam analysis. 

The first structural study of a UPD layer involved the formation of a series of Agl monolayers on Pt(lll) single crystals [132, 133], Pt is the quintessential catalytic metal, and thus reacts with almost any organic compound, other than simple alkanes [134], in other words, it is easily contaminated. In the early days of UHV-EC studies, contamination during transfer of Pt single crystals from the analysis chamber to the electrochemical cell and back was the chief stumbling block to well-defined studies of... 

Benoit, G. Hunter, K. S. Rozan, T. F. Sources of Trace Metal Contamination Artifacts During Collection, Handling, and Analysis of Freshwaters, Anal. Chem. 1997, 69, 1006-1011. Keith, L. H., ed. Principles of Environmental Sampling, American Chemical Society Washington, DC, 1988. 

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