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Contact materials next-generation

A common application for elastomeric molds is for micro- or nanocontact printing, where a self-assembled monolayer (SAM) is placed on both planar and curved surfaces via contact with the reliefs on the mold (Figure 6.66). SAMs will be an important architecture for the next generation of nanostructured materials. [Pg.344]

The next generation electrical contact materials based on bismuth-silver compositions are suitable for automobile sectors, since they do not weld or arc under heavy loads. The unique conduction properties of bismuth have led to the production of plastics with a built-in shielding protection against electromagnetic or radio-frequency interferences and electrostatic discharge which create serious disturbance to the electronic equipment around us. [Pg.15]

Next-generation soft contact lenses, dental polymers, surface coatings, and similar materials are produced from compounds of varying structure and reactive functionality. For example, currently in development are new soft lenses that will be manufactured from monomers synthesized with dimethylsil-oxane backbones. The dimethylsiloxane backbone is terminated with a methacryloxy functionality that supplies the site for polymerization. The siloxane provides lens softness. Occasionally the functionality is formed on both ends of the monomer, resulting in undesired properties. The compound BisGMA is a monomer that is polymerized to form hard dental structures. In the monomer synthesis process impurities are coproduced that interfere with the polymerization. Finally, diacetone acrylamide used in a copolymerization process is another specialty monomer that is occasionally contaminated with difficult-to-remove impurities. These three monomers are quite reactive at modest temperature and cannot be purified by distillation. The three examples that are presented here derive from as yet unpublished research (Krukonis, 1982c). [Pg.285]

This chapter gives an overview on corrosion phenomena and potential mechanical properties degradation of reference structural materials when in contact with liquid Na and Pb/Pb-Bi, which are the coolants of the Generation IV reactors SFR and LFR. The reference materials for the key components of these two reactor types have been already specified. These materials are mainly austenitic and ferritic/martens-itic steels. Moreover, ODS alloys are considered as the potential next generation of cladding material in order to increase fuel burn-up. [Pg.68]

If we put a sample next to one thermocouple and a "standard" or reference" next to the other, we can follow any thermal changes that may take place as both are heated since each TC generates Its own EMF as the temperature changes. Thus, If we put a reference material, R, directly in contact with the "TC(1)" thermocouple junction (hereinafter, we will refer to this thermocouple junction as "R") and a sample, S, at TC(2), l.e.- S , then we can detect any thermal change that may occur if either R or S undergoes a transformation as it is heated. [Pg.361]

The percolation model of adsorption response outlined in this section is based on assumption of existence of a broad spread between heights of inter-crystalline energy barriers in polycrystals. This assumption is valid for numerous polycrystalline semiconductors [145, 146] and for oxides of various metals in particular. The latter are characterized by practically stoichiometric content of surface-adjacent layers. It will be shown in the next chapter that these are these oxides that are characterized by chemisorption-caused response in their electrophysical parameters mainly generated by adsorption charging of adsorbent surface [32, 52, 155]. The availability of broad spread in heights of inter-crystalline barriers in above polycrystallites was experimentally proved by various techniques. These are direct measurements of the drop of potentials on probe contacts during mapping microcrystal pattern [145] and the studies of the value of exponential factor of ohmic electric conductivity of the material which was L/l times lower than the expected one in case of identical... [Pg.72]


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