Conductivity polyaniline carboxylic acid

Another interesting work conducted by Wamser and co-workers in the field of porphyrin monomer sensitizers is the functionalization of tetraphenylporphyrin at the para positions of -phenyl with one amino group and three carboxylic acid groups. The resulted asymmetrical porphyrin (45) can be successfully fabricated into a modified solid Gratzel type cell with polyaniline as the solid electrolyte. The overall energy conversion efficiency of this cell is about 2% with a number of opportunities to optimize the efficiency remaining [81]. 

In addition to sulfonic acid groups, carboxylic acid groups as ring substituents results in self-doping of polyaniline and influence properties such as solubility, pH dependent redox activity, conductivity, thermal stability, etc. Sulfonated polyanilines are typically obtained by postpolymerization modifications such as electrophilic and nucleophilic substitution reactions. However, carboxylic-acid-functionalized polyanilines are typically synthesized directly by chemical and electrochemical polymerization of monomer in the form of homopolymer or copolymer with aniline. In contrast to sulfonated polyaniline, very few monomers are available for the synthesis of carboxyl acid functionalized polyaniline. Anthranilic acid (2-aminobenzoic acid) is an important monomer and is often used for the synthesis of carboxyl acid functionalized polyanilines. 

Hyperbranched poly(acrylic acid) films have been grown on SAMs of alkanoic acid [137]. These films, rich in carboxylic acid groups could be utilized to selectively bind metal ions or serve as sites for further derivatization. Wurm et al. have studied electrochemically induced epitaxial polymerization [135] of iV-alkylpyrrole in solution onto a SAM composed of ((A -pyrrolyl)-n-undecyl)disulfide. These optically smooth films of long chain poly(iV-alkylpyrrole) have excellent stability in air. The Collard group [142] has studied the kinetics of electro-oxidatively polymerized polyaniline and polypyrrole on surfaces modified with SAMs formation of conducting films is initially blocked by the monolayer but nucleation at SAM defect sites leads to eventual deposition of rough polymer films. 

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