Capacitively powered plasma, electrical

Figure 2. Electrical analog for capacitively powered plasma.

Impedance matching networks are used to couple the maximum amount of power into the plasma by reducing the reflected power. The matching network should be placed as close as possible to the rf electrode and connected to the electrode with low capacitance and low inductance leads. The matching networks can be manually tuned or self-tuned. Avoid ground loops in the electrical circuits i.e., ensure that each power unit is independently tied to a common ground and not to another power unit. 

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