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Bosch trench process

For automotive applications, the various functions require several special material properties. Here, we concentrate on properties of thin films rather than on their production processes. A wide range of publications deal with sensor-specific processes, for example, silicon reactive ion etching (RIE) using the Bosch trench process [2] and sacrificial oxide etching [3, 4]. The details of standard deposition and structuring processes are described in numerous books on semiconductor technology (e.g., [5, 6]), and they are not discussed in depth here. [Pg.142]


See other pages where Bosch trench process is mentioned: [Pg.111]    [Pg.177]    [Pg.113]    [Pg.68]    [Pg.2770]    [Pg.3333]    [Pg.221]    [Pg.49]    [Pg.1676]    [Pg.1778]    [Pg.2084]    [Pg.13]    [Pg.103]   
See also in sourсe #XX -- [ Pg.142 ]




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