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Bonding processes cleaning

Fig. 4. Diffusion bonding process (a) apply metal foil and cut to shape, (b) lay up desired pHes, (c) vacuum encapsulate and heat to fabrication temperature, (d) apply pressure and hold for consoHdation cycle, and (e) cool, remove, and clean part. Fig. 4. Diffusion bonding process (a) apply metal foil and cut to shape, (b) lay up desired pHes, (c) vacuum encapsulate and heat to fabrication temperature, (d) apply pressure and hold for consoHdation cycle, and (e) cool, remove, and clean part.
The problem is to evaluate cross-contamination of the assembly hall by VOCs from the chemical cleaning and bonding process in the treatment hall. [Pg.1090]

Confirm the effectiveness of a bonding process, such as surface cleaning or curing. [Pg.437]

Sealing structures to produce ftquid-tight enclosures (chambers and channels) is a key step in the fabrication of a microdevice. Several different processes are available depending on the materials employed. However, in nearly all cases some method of surface cleaning is necessary before the bonding process. [Pg.249]

It is advisable to use a stainless steel, glass or wood spatula and a clean working area (glass, aluminum foil) or a disposable plastic cup for the mixing of adhesives (preferably polythylene or polypropylene since plastics like polystyrene, polycarbonate or polyvinyl chloride may swell due to components of the adhesive). Tip For frequent bonding processes with low adhesive consumption, even so-called pill cups (content approximately 20 ml) of polyethylene or polypropylene are suitable, which are available in drug stores. [Pg.73]

The reaction medium also plays an important role in adsorption processes. Clean surfaces exist only in dry conditions, when the surface is exposed to gases at low pressure. Under hydrated conditions, when the metal oxide surface is covered with water, the surface sites are not available to other molecules. As a consequence, either the adsorption is strong enough to cause desorption of the water molecules that are directly bound to the clean surface, or attachment occurs directly upon these groups through H-bonds. [Pg.408]

Cleaning, or removal of contamination, including process oils, dirt, waxes, mold release agent, and exuded plasticizer, is an important change that occurs as a result of surface treatment. Methods involving chemicals such as solvent cleaning and etching, if not properly used, can leave behind a residue that may interfere with adhesive bond formation. Clean surfaces must be protected because of rapid reacquisition of contamination from the ambient atmosphere. [Pg.58]

Organomagnesiums frequently prove superior also in other types of reactions. They may facilitate the oxidation of a carbon-metal to a carbon-oxygen bond, secure clean monoaddition of an acetylide to an activated ester (a critical issue in a monensin synthesis X favor in the presence of a copper catalyst 1,4-addition onto a conjugated enone over 1,2-addition, reorient the attack of formaldehyde on a benzylic entitiy from the a- to the or /to-position, and provide diastereoselectivity in nucleophilic additions onto aldehydes. Furthermore organomagnesiums combine under carbon-carbon linking with a variety of organic halides, tosylates, and acetates if the process is mediated by transition elements such as palladium(O) copper(I), nickel(II) or iron(II) Organoalkalis are often less fit to enter such catalytic cycles. [Pg.20]

Only one exception to the clean production of two monomer molecules from the pyrolysis of dimer has been noted. When a-hydroxydi-Zvxyljlene (9) is subjected to the Gorham process, no polymer is formed, and the 16-carbon aldehyde (10) is the principal product in its stead, isolated in greater than 90% yield. This transformation indicates that, at least in this case, the cleavage of dimer proceeds in stepwise fashion rather than by a concerted process in which both methylene—methylene bonds are broken at the same time. This is consistent with the predictions of Woodward and Hoffmann from orbital symmetry considerations for such [6 + 6] cycloreversion reactions in the ground state (5). [Pg.428]


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