Auger spectra substrate

For a compound semiconductor to be useful as a substrate in studies of electrodeposition, it is desirable that clean, unreconstructed, stoichiometric surfaces be formed in solution prior to electrodeposition. For CdTe, the logical starting point is the standard wet chemical etch used in industry, a 1-5% Brj methanol solution. A CdTe(lll) crystal prepared in this way was transferred directly into the UHV-EC instrument (Fig. 39) and examined [391]. Figure 66B is an Auger spectrum of the CdTe surface after a 3-minute etch in a 1% Br2 methanol solution. Transitions for Cd and Te are clearly visible at 380 and 480 eV, respectively, as well as a small feature due to Br at 100 eV. No FEED pattern was visible, however. As described previously, a layer of solution is generally withdrawn with the crystal as it is dragged (emersed) from solution (the emersion layer). After all the solvent has evaporated, the surface is left with a coating composed of the... 

The XPS survey spectrum of a 75 nm thick film of plasma polymerized acetylene that was deposited onto a polished steel substrate is shown in Fig. 18 [22]. This film consisted mostly of carbon and a small amount of oxygen. Thus, the main peaks in the spectrum were attributed to C(ls) electrons near 284.6 eV and 0(ls) electrons near 533.2 eV. Additional weak peaks due to X-ray-induced O(KVV) and C(KLL) Auger electrons were also observed. High-resolution C(ls) and 0(ls) spectra are shown in Fig. 19. The C(ls) peak was highly symmetric. 

Figure 6. XPS C Is (left) and 0 Is (right) spectra of the interfacial substrate surface of epoxy-amine coating on bare steel following cathodic polarization testing (solid curves). Also shown is an approximate curve resolution for each spectrum components of the C Is spectrum are, from left, alkane, ether, and carbonate principal components of the 0 Is spectrum are, from left, iron oxide, carbonate, ether, ad adsorbed water (29.) or sodium Auger ( ). Reproduced with permission from Ref. 29. Copyright 1981, Pergamon Press.

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