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Applications and CMP-Related Process Problems

Deposit Less, Polish Less vs Deposit More, Polish More [Pg.245]

As the integrated circuit (IC) industry has chosen chemical mechanical planarization (CMP) as one of the indispensable processes in the generations of transistor gate lengths equal to or smaller than 0.35/im, it is imperative that the CMP-related process problems be investigated and [Pg.245]

Copyright (0 2000 by Academic Press All rights of reproduction in any form reserved. [Pg.245]

Shin Hwa Li, Visun Bucha, and Kyle Wooldridge, Applications and CMP-Related Process Problems... [Pg.195]

See other pages where Applications and CMP-Related Process Problems is mentioned: [Pg.245] [Pg.247] [Pg.251] [Pg.257] [Pg.259] [Pg.261] [Pg.265] [Pg.267] [Pg.269] [Pg.271] [Pg.273] [Pg.275] [Pg.277] [Pg.279] [Pg.281] [Pg.245] [Pg.247] [Pg.251] [Pg.257] [Pg.259] [Pg.261] [Pg.265] [Pg.267] [Pg.269] [Pg.271] [Pg.273] [Pg.275] [Pg.277] [Pg.279] [Pg.281] [Pg.321]

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Application Problems

Process Applicability

Process applications

Process problems

Processability and Applications

Processes and problems

Processing and applications

Processing applications

Processing problems

Related Problems