Antireflection coatings preparation

Wydeven T, Kubacki R. Antireflection coating prepared by plasma polymerization of perfluo-robutene-2. Appl Optics 1976 15 132-6. 

Polymeric barbituric acid derivatives, (III), prepared by Kishioka et al. (3) were effective as antireflective coatings for semiconductors. 

Poly(2-acrylamido-2-methyl-l-propanesulfonic acid and isopropylhexafluor-oalcohol), (IV), was prepared by Khojasteh et al. (4) and used as a top antireflective coating and barrier layer for immersion lithography. 

Figure 17.14 shows the appearance of CRT surface coating prepared with a photo intensity of 12 mW/cm at 100°C. Antireflective/antistatic thin film is prepared on half the area of the CRT panel surface, indicating good antireflection effect. 

Materials. Alicyclic polymers such as poly(CBN-a/t-MAH) and poly(CBN-co-NBCA) were synthesized by free radical and Pd(II)-catalyzed addition polymerization techniques, respectively, the details of which are given in References (2,3) and in (Okoroanyanwu, U. Byers, J. Shimokawa, T. Willson, C.G. Chem. Mater., 1998, in press) (Okoroanyanwu, U. Shimokawa, T. Byers, J. Willson, C.G. Chem. Mater., 1998, in press). Triphenylsulfonium hexafluoroantimonate (TPSHFA) was prepared according to the literature procedure (5). CD 11 anti-reflective coating was obtained from Brewer Scientific Company. BARL antireflective coating was obtained from IBM Corporation. PD-523AD developer, 0.2 IN aqueous tetramethylammonium hydroxide solution with surfactant was obtained from Japan Synthetic Rubber Company. LDD-26W developer, 0.26N aqueous tetramethylammonium hydroxide, was obtained from Shipley Company. 

Lobl, H.P., Huppertz, M., and Mergel, D. (1996) ITO films for antireflective and antistatic tube coatings prepared by d.c. magnebon sputtering. Suif. Coat. 

Electrodeposited sol-gel-based composite films also showed optical applications. Gu and coworkers [85,86] co-electrodeposited Te0 > -Si02 hybrid films from the TEOS-Te(i-PrO)4 niixed precursor for nonlinear optics. Te(IV) was partially reduced during electrodeposition, as characterized by EDX of the obtained films. The as-prepared films had third-order nonlinear susceptibility ix ) of 5.9 X10 to 4.29 X 10 esu, and the films had of 1.551 X 10 esu after posttreatment annealing. Mandler and coworkers co-electrodeposited TMOS with multiwalled carbon nanotubes (MWCNTs) on ITO and silver. The optimized films electrodeposited on ITO showed transparency of about 50% with nonlinear optical properties, and the optimized films electrodeposited on silver had specular reflectance lower than 0.5% in the wavelength range of 400-15 000 nm, which can be used as antireflection coatings. 

The performance of the films can be further improved by co-electrodeposition with other species such as metals, nanoparticles, and carbon nanotubes. Moreover, electrodeposited sol-gel films may also serve as a platform for embedding fiuictional materials. Specifically, the sol-gel system is ideal for immobilizing bioactive species, such as enzymes and bacteria thus, electrodeposition approach allows simple one-step fobrication of biosensors. Electrodeposition also yields selective deposition of silane/CNT antireflective coatings on conductive patterns. Molecularly imprinted films are prepared by co-electrodeposition of the target molecule with sol-gel followed by its removal. 

Langlet, M., Burgos, M., Coutier, C., Jimenez, C., Morant, C., and Manso, M. (2001) Low temperature preparation of high refractive index and mechanically resistant sol-gel Ti02 films for multilayer antireflective coating applications. /. Sol-Gel Set Technol, 22, 139-150. 

Chi, F., Yan, L., Haibing, L.V., Yan, H., Yuan, X., and Jiang, B. (2012) Sol-gel preparation of ultralow refractive index magnesium fluoride optical films for broadband antireflective coatings. Nanosci. Nanotechnol. Lett., 4,441 444. 

Antireflective siloxane polymers coating compositions consisting of the reaction product of 2-(3,4-epoxycyclohexyl)-ethyl-trimethoxysilane, phenyltri-methoxysilane, methyltrimethoxysilane, and water were prepared by Zhang et al. (4) and used in photoresist compositions that were sensitive at 157 nm. 

Monodispersed polystyrene sols are used as calibration standards for electron microscopes, light scattering photometers, Coulter counters, particle sieves, etc. Monodispersed silica is used for antireflection lens coatings. Monodispersity (even at a modest level) can usefully be exploited in photographic film, magnetic devices, pharmaceutical preparations and catalysis. 

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