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X-ray resist materials

In addition to good sensitivity, issues for X-ray resist materials are analogous to those of optical and e-beam resists resolution, contrast, etch resistance, thermal stability, and adhesion. To stay competitive with e-beam and even optical lithography, X-ray lithography must have a resolution performance better than 0.5 p,m. An extensive list of X-ray resist properties has been collected in the literature (83, 116, 121). [Pg.357]

X-ray resist materials—Continued acetals, 260-261,264 aqueous base, 265,267-270/ r rt-butoxycaibonyl, 260-261,263 evolution of market, 258-260 requirements, 258-267 resolution, 260-262/... [Pg.571]

See other pages where X-ray resist materials is mentioned: [Pg.234]    [Pg.258]   
See also in sourсe #XX -- [ Pg.258 , Pg.259 , Pg.260 , Pg.261 , Pg.262 , Pg.263 , Pg.264 , Pg.265 , Pg.266 , Pg.267 , Pg.268 , Pg.269 ]



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