Wafer Scale Batch Fabrication of SECM-AFM Probes

4 Wafer Scale Batch Fabrication of SECM-AFM Probes 

Several research groups have been active in this area and include Kranz and colleagues [37,38], Staufer and coworkers [39-43], Fasching and cowoikers [44,45], Macpherson and coworkers 

FIGURE 17.5 (a) Schematic representation of the conductive probe. The metal was embedded between two 

Si jNy thin films and the tip was insulated with Si02- (b and c) Scanning electron micrographs of the fabricated probes the total height of the tip is 5 pm. (d) TEM image of the Pt Si tip apex. The scale bars are (b) 50 pm, (c) 5 pm, and (d) lOOnm (scale bar in the inset is also lOOnm). (Reproduced from Frederix, P.L.T.M. et al.. Nanotechnology, 16, 997, 2005.) 

FIGURE 17.6 (a) Single and (b) dual probes with bended nanoprobes for combined electrochemical and 

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