Visible light lithography

The varieties of exposure sources that have found applications in UV and visible light optical lithography can be broadly divided into two groups (i) high-pressure arc lamp or incoherent sources and (ii) laser sources or temporally coherent sources. In the laser-type sources, we include all techniques and devices for radiation generation that have their basis in stimulated emission of radiation. 

To avoid the negative properties of PDMS and variations of PDMS, researchers have investigated the use of fluoropolymers as mold materials in soft lithography. Fluoropolymer elastomeric moltb have lowered surface energies, tunable modulus, chemical stability, transparency to visible light, and solvent resistance. Rolland et have developed photocurable... 

Optical Lithography. Optical Hthography uses visible or ultraviolet light as the exposure media, and is the dominant Hthographic process used for patterning IC wafers. The linewidth limit is near 0.4 p.m, although some narrower features may be possible (34). The masks typically are made from patterned, opaque chromium films on glass. 

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