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Virtual reality with monitors

DMU is a core method in CE in the aerospace industry for assembly examination, layout examination, interference checking, and maintainability (see Chap. 13). Based on complete CAD data and a powerful PDM system, DMU can be created synchronously with each design activity. Based on advantages of DMU, the use of the Physical Mock-up has been reduced dramatically over the past years. Beside of standard monitors, many diff erent graphics devices are used for graphical output in aerospace industry (mobile devices, virtual, augmented and mixed reality). [Pg.587]

Figure 11.7 Low output impedance system. A, Buffered voltage supply to provide constant drain voltage B, FET, e.g. 2N3819 note the gate connection in reality is short (u) C, cell D, feedback amplifier to give low measurement impedance , constant-current source X, virtual earth. A3 is in a feedback loop with the reference electrode and cell. This provides appropriate values of Vq to give Fog and /d, i.e. the operating point is independent of the transistor used. and are kept constant, this being the case Iq and Fqs are also constant under steady state conditions. Change in potential is monitored through the calomel reference electrode. A similar feedback system was used by Janata et ai (11). Figure 11.7 Low output impedance system. A, Buffered voltage supply to provide constant drain voltage B, FET, e.g. 2N3819 note the gate connection in reality is short (u) C, cell D, feedback amplifier to give low measurement impedance , constant-current source X, virtual earth. A3 is in a feedback loop with the reference electrode and cell. This provides appropriate values of Vq to give Fog and /d, i.e. the operating point is independent of the transistor used. and are kept constant, this being the case Iq and Fqs are also constant under steady state conditions. Change in potential is monitored through the calomel reference electrode. A similar feedback system was used by Janata et ai (11).

See other pages where Virtual reality with monitors is mentioned: [Pg.50]    [Pg.155]    [Pg.170]    [Pg.819]    [Pg.143]    [Pg.326]    [Pg.46]    [Pg.248]    [Pg.191]   
See also in sourсe #XX -- [ Pg.155 ]




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