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Vapor phase axial deposition

Positronium formation is also sensitive to ion-implanted amorphous Si02. Figure 9.7 shows the intensity of the long-lived component, IL, as a function of the positron incident energy for Xe ion-implanted amorphous Si02 ([22]). The sample was obtained by a vapor-phase axial deposition (VAD) method. Xe ions of 400 keV were implanted into the sample to doses of 1 x 1014 and 5 x 1015 ions/cm2 at room temperature. While there is a small difference between IL of 1 x 1014 and II of 1 x 1015, both have a minimum at around 4-5 keV, corresponding to the mean positron implantation depth of -200 nm at which the ions are implanted. [Pg.245]

Finally, Vapor Phase Axial Deposition (VAD) is used for forming optical fibers. This... [Pg.85]

Fig. 21. Schematic illustration of the four primary vapor-phase deposition processes used in optical-fiber fabrication outside vapor deposition (OVD), modified chemical vapor deposition (MCVD), plasma vapor deposition (PVD), and vapor axial deposition (VAD) (115). Fig. 21. Schematic illustration of the four primary vapor-phase deposition processes used in optical-fiber fabrication outside vapor deposition (OVD), modified chemical vapor deposition (MCVD), plasma vapor deposition (PVD), and vapor axial deposition (VAD) (115).
There are four principal processes that may be used to manufacture the glass body that is drawn into today s optical fiber. "Outside" processes—outside vapor-phase oxidation and vertical axial deposition— produce layered deposits, of doped silica by varying the concentration of SiCl4 and dopants passing through a torch. The resulting "soot" of doped silica is deposited and partially sintered to form a porous silica boule. Next, the boule is sintered to a pore-free glass rod of exquisite purity and transparency. [Pg.56]

Manufacturing economics require that many devices be fabricated simultaneously in large reactors. Uniformity of treatment from point to point is extremely important, and the possibility of concentration gradients in the gas phase must be considered. For some reactor designs, standard models such as axial dispersion may be suitable for describing mixing in the gas phase. More typically, many vapor deposition reactors have such low L/R ratios that two-dimensional dispersion must be considered. A pseudo-steady model is... [Pg.426]

Significant hydrothermal sites are known from a number of on- and off-axis seamounts. These include the Axial Volcano site on the JFR, a large sulfide deposit on a near-axis volcano at 13°N EPR, Loihi seamount in the Hawaiian-Emperor chain, the Lucky Strike hot-spot-related seamount site on the MAR, and a number of other localities. Axial Volcano and Lucky Strike have been studied most thoroughly, and have high-temperature hydrothermal systems. The Ashes vent field on the summit of Axial Volcano was the first to show effects of boiling at the reduced pressures encountered on the seamount relative to a normal ridge crest (Massoth et al. 1989). Many ridge-crest vent fields have been discovered in the last decade that show the effects of phase-separation into low-salinity vapor and more saline fluid (Butterfield 2000). [Pg.480]


See other pages where Vapor phase axial deposition is mentioned: [Pg.371]    [Pg.219]    [Pg.220]    [Pg.2522]    [Pg.1547]    [Pg.371]    [Pg.219]    [Pg.220]    [Pg.2522]    [Pg.1547]    [Pg.514]    [Pg.386]    [Pg.534]    [Pg.732]    [Pg.476]    [Pg.272]    [Pg.777]    [Pg.238]   
See also in sourсe #XX -- [ Pg.85 ]

See also in sourсe #XX -- [ Pg.2 , Pg.2 , Pg.2 , Pg.3 , Pg.17 ]

See also in sourсe #XX -- [ Pg.2 , Pg.2 , Pg.2 , Pg.3 , Pg.17 , Pg.18 ]




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Phase Deposition

Vapor axial deposition

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