Vacuum monitoring mass flow controllers

Process Control Monitors. Deposition kinetics were investigated by accurately measuring RF power, monomer pressure, and monomer flow. The actual RF power dissipated in the gas discharge was determined by taking the difference between the net power delivered to the gas discharge and the net power delivered to the system under vacuum. Pressure was measured to a precision of 1 millitorr with a capacitance manometer. Gas flow was reproduced to a precision of 0.1 SCCM with a Hastings Mass Flow Meter. 

Fig. 4.2 (a) Experimental setup for temperature-programmed desorption performed in vacuum. The sample (monocrystal or a thin layer of powder) is exposed at the sample holder, which is connected to the system for temperature controL The pumping speed has to be high enough to allow the monitoring of desorbed species by mass spectrometer. Inset presents the output of one TPD experiment— the TPD profile [5]. (b) In the flow systems, sample is placed in the sample holder, inside the furnace [10]... 

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