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Vacuum deposition processes comparison

Table 2.2 Comparison of Operational Factors of Vacuum Deposition Processes... Table 2.2 Comparison of Operational Factors of Vacuum Deposition Processes...
Figure 25 shows the temperature dependence of relaxation time for the relaxation processes in the internal and interfacial regions of the ultrathin PS1.46M film sandwiched between the SiO layers. Since it was hard to distinguish the temperature-Ta relations between the vacuum deposited and laminated films, each data point was averaged over six independent measurements including both vacuum deposited and laminated films. The average thickness was about 40 nm. For comparison, the dashed curve in Fig. 25 denotes the bulk data obtained by the Vogel-Fulcher equation [72, 73] ... [Pg.25]

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