Ultrathin preparative aspects

Perhaps the greatest disadvantage of CSD is the difficulty in depositing ultrathin films (thickness <30 nm). While the possibility has been demonstrated in selected systems, the method is not usually viewed as amenable to that thickness requirement. Another disadvantage of CSD is the fact that three-dimensioanl structures with high aspect ratios cannot be conformally coated. Lastly, while epitaxial films have been prepared by the method, ° generally the films produced are polycrystalline and often not oriented. 

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