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TiAlOx oxide

Single or multiple layers of TiAlOx, AI2O3, TiA10x/Al203, and T1O2/AI2O3 were synthesized by magnetron sputter-deposition techniques, and more recently by atomic layer (ALD) deposition (see details of oxide layer synthesis in the ehapter Microchip-Embedded Capacitors for Implantable Neural Stimulators). [Pg.71]

The ongoing work on the development of high-K oxide TiAlOx has been focused on those issues, and it is hoped that they will not hinder the application of this multifunctional material. [Pg.342]

See other pages where TiAlOx oxide is mentioned: [Pg.77]    [Pg.77]    [Pg.334]    [Pg.334]    [Pg.335]    [Pg.341]    [Pg.342]    [Pg.342]   
See also in sourсe #XX -- [ Pg.77 ]



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