Thin films, preparation research needs

Because of the sequential nature of atomic layer deposition, it is a slow method for preparing thin films. The sequential nature, however, also produces a film of uniform thickness, referred to as a conformal film. This is important when the surface being coated is not atomically flat, but rather, has troughs and islands to be coated. Some of the most important technological materials, such as silicon and germanium, have not shown themselves to be amenable to the atomic layer deposition technique. This points to the need for continued research in the field of precursor synthesis. 

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