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Thin film science and technology

H. K. Pulker, Thin Films Science and Technology, Elsevier, Amsterdam, 1985. [Pg.127]

Thin film science and technology is the deposition and characterization of layered structnres, typically less than a micron in thickness, which are tailored from the atomic scale upwards to achieve desired functional properties. Deposition is the synthesis and processing of thin films under controlled conditions of chemical processing. Chemical vapor deposition (CVD) and gas-phase molecular beam epitaxy (MBE) are two processes that allow control of the composition and structure of the films. Characterization is the instrumentation that use electrons, X-ray, and ion beams to probe the properties of the film. Epitaxial films of semiconductors are used for their electronic properties to emit light in the infrared (IR) and the ultraviolet rays. [Pg.3061]

See other pages where Thin film science and technology is mentioned: [Pg.9]    [Pg.2137]    [Pg.3061]    [Pg.3062]    [Pg.3063]    [Pg.3064]    [Pg.3065]    [Pg.3066]    [Pg.3067]    [Pg.3068]    [Pg.3069]    [Pg.3070]    [Pg.3071]    [Pg.3072]    [Pg.3072]    [Pg.3073]    [Pg.381]   
See also in sourсe #XX -- [ Pg.3061 , Pg.3062 , Pg.3063 , Pg.3064 , Pg.3065 , Pg.3066 , Pg.3067 , Pg.3068 , Pg.3069 , Pg.3070 , Pg.3071 ]



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Thin-film technologies

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