The Self-assembled Monolayer Approach

Another approach in generating molecular insulating layers without the need of chemical conversion after deposition is the use of preliminarily modified molecules which can form dense self-assembled monolayers. To create dense self-assembled monolayers with sufficient robustness and insulating properties, a modified alkyltrichlorosilane with an aromatic end-group (18-phenoxyoctadecyl)tri-chlorosilane (PhO-OTS chemical structure Fig. 6.15a) was synthesized and tested [50]. The SAMs were created in a one-step process from vapor phase or solution. On self-assembly on a natively oxidized silicon surface the n-n interaction between the phenoxy end-groups of adjacent molecules creates an intermolecular top-link, leading to a more closely packed surface compared to monolayer than when linear end groups are used. 

It was shown by surface analysis (AFM and STM) that these films cover large areas (micrometer scale) without the occurrence of pinholes, furnishing a molecular flat amorphous surface with good short-range order but no long-range order, and thus free of domain boundaries (Fig. 6.13). 

The device yield of TFTs with molecular gate dielectrics would be expected to be low, because of defects in the thin self-assembled monolayer arising from the imperfect surface of the evaporated aluminum bottom electrode. Results obtained on 

---