The Possibility of Argon Chemistry

The existence of krypton and xenon compounds inevitably raises the question as to whether noble-gas chemistry might be extended to argon. The increasing range of krypton compounds that have been synthesized over the last 10 years, and in particular the recent observation of Kr-0 and Kr-N species, will undoubtedly further stimulate interest in this area. 

---

Recent Review Literature The Possibility of Argon Chemistry Krypton Chemistry Xenon Chemistry... 

The application of the salt/molecule reaction technique to the study of reactions with Lewis bases such as H2O and NH3 presents the possibility for a different type of interaction which may find some cinalogy in transition metal coordination chemistry. The structure of small complexes such as MX H20 are of considerable interest both experimentally and theoretically. These studies were initiated as a result of the observation of several beinds in the spectrum of alkali halide salts in argon which could not readily be assigned to the isolated salt species. Rather, it was shown that these bands were due to reaction of the salt with impurity H2O, which was always present in these experiments to some degree. A study was then initiated to investigate these beinds, and the nature of the reaction conplex. 

The chemistry of argon is still in its infancy. Photolysis of HF in a sohd argon matrix results in the formation of HArF, which has been identified by comparing the IR spectra of H ArF, H ArF and H ArF. Theoretical studies suggest that the formation of Ar and Ar i bonds should be possible. 

Such unusual chemical elements as helium, neon, argon, krypton, and xenon were discovered by their spectra. They were termed noble or inert ga.ses. Their content in the atmosphere is extremely low. For a long time these gases were considered to be quite incapable of chemical reactions and some even believed that the name of a chemical element was inapplicable to them. Inert elements were discovered without the aid of chemistry but their extraction from the atmosphere and separation from one another became possible only after the development of methods of gas liquefaction at low temperatures. 

New data concerning the interaction of ions and hydrocarbon radicals allow to have a quite complete mapping of the relevant reaction rates in an Ar/CH4 plasma by now and it is possible to investigate the effect of the chemical kinetics in such a system and eventually to identify the gaseous precursor of the chemical species incorporated in the deposited film. We have modeled the gas-phase chemistry of a typical radio frequency CH4/ Ar plasma used for the deposition of diamond and diamond-like carbon films, with the aim of understanding the effects of the chemical kinetics of argon ions and metastables. 

---