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The EUV exposure system comprises the plasma source (for generating the plasma that in turn emits EUV photons), the source collection optics (comprising the condenser and illumination optics), and the projection optics. A schematic of an EUV exposure tool is shown in Eig. 14.8. [Pg.715]

La Fontaine, EUV optics, in Extreme Ultraviolet Lithography, B. Wu, A. Kumar, Eds., Chapter 4, McGraw Hill, New York (2009). [Pg.715]

See other pages where The EUV exposure system is mentioned: [Pg.715]