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Interstitial tetrahedral site

Point defects and complexes exliibit metastability when more than one configuration can be realized in a given charge state. For example, neutral interstitial hydrogen is metastable in many semiconductors one configuration has H at a relaxed bond-centred site, bound to the crystal, and the other has H atomic-like at the tetrahedral interstitial site. [Pg.2885]

In addition to the configuration, electronic stmcture and thennal stability of point defects, it is essential to know how they diffuse. A variety of mechanisms have been identified. The simplest one involves the diffusion of an impurity tlirough the interstitial sites. For example, copper in Si diffuses by hopping from one tetrahedral interstitial site to the next via a saddle point at the hexagonal interstitial site. [Pg.2888]

Throughout the remaining sections of this chapter, various configurations for complexes that include hydrogen will be discussed. Figure 1 shows a schematic of a [110] plane that includes a substitutional impurity. The following sites for an H atom attached to the impurity are labeled the bond-centered site (BC), the tetrahedral interstitial site (T), the antibonding site (AB), and the C-site (C). [Pg.159]

Fig. 9. Calculated angular scans for 700 keV 3He ions in (110) silicon for different 2H lattice sites the tetrahedral interstitial site (T), a back-bonded site 1.5 A from a lattice site (BB), and a bond-centered site (BC). From Marwick et al. (1988). Fig. 9. Calculated angular scans for 700 keV 3He ions in (110) silicon for different 2H lattice sites the tetrahedral interstitial site (T), a back-bonded site 1.5 A from a lattice site (BB), and a bond-centered site (BC). From Marwick et al. (1988).
One of the earliest studies was an MNDO-cluster treatment by Corbett et al. (1983) of the isolated interstitial hydrogen and the corresponding molecule. In this early study, the isolated H was found to be stable at the M-site in silicon. This is directly between two adjacent C-sites, where the C-site is directly between next-near-neighbor silicons. (We note that in these calculations, the C- and M-site energies are very similar.) It was not known at that time, however, that the BC site is the stable location for neutral isolated interstitial hydrogen (see Chapter 16). In the Corbett study, an H2 molecule was found to be stable (or at least, metastable) in the tetrahedral interstitial site when oriented along a (111) direction. The... [Pg.556]

Preston, 1978) account for roughly 100% of the total. Thus the muon is at a tetrahedral interstitial site with four Cu nearest neighbors, with the spin density confined to the closest ten atoms, and appreciable density on all ten. Recent experiments at TRIUMF show that Mufl is centered about the same T site as Mu7 (Schneider et al., 1990b). [Pg.593]

The close correspondence between the properties of Mu in Si as determined by /u,SR and pLCR and those for the AA9 center produced by implanting hydrogen in silicon shows that Mu in silicon and the AA9 center are isostructural and in fact almost identical. They are neutral isolated bond-centered interstitials. Numerous theoretical studies support this conclusion. The observation of such similar centers for muonium and hydrogen supports the generalization that hydrogen analogs of many of the muonium centers exist. Of course, this assumes that the effects of the larger zero-point vibration of the muon relative to the proton do not make a major contribution to structural differences. The p-SR experiments, reinforced by theory, demonstrate that another structure also exists for muonium in silicon, called normal muonium or Mu. This structure is metastable and almost certainly is isolated neutral muonium at a tetrahedral interstitial site. [Pg.593]

Fig. 1. Location of various high-symmetry sites in the diamond structure. T is the tetrahedral interstitial site, H is the hexagonal interstitial site, B the bond center, and C is at the center of a rhombus formed by three adjacent Si and the nearest T. The M site is midway between two C sites it is also located midway between B and a neighboring H site. Fig. 1. Location of various high-symmetry sites in the diamond structure. T is the tetrahedral interstitial site, H is the hexagonal interstitial site, B the bond center, and C is at the center of a rhombus formed by three adjacent Si and the nearest T. The M site is midway between two C sites it is also located midway between B and a neighboring H site.
Although the face-centred cubic structure of metals is close packed, it is still possible for atoms which are much smaller than the host metal atoms to fit into interstitial sites inside the structure, while maintaining the essential properties of metals such as electrical conductivity and heat transport. These interstitial sites are of two kinds. The octahedral interstitial sites have six metal atoms at equal distances from the site, and therefore at the apices of a regular octahedron. The tetrahedral interstitial sites have four nearest neighbour metal atoms at the apices of a regular tetrahedron. A smaller atom can just fit into the octahedral site if the radius ratio is... [Pg.181]

Figure 5.8 Interstitial diffusion (a) interstitial diffusion involving the direct migration of an interstitial atom to an adjacent site in the crystal (b, c) some of the octahedral and tetrahedral interstitial sites in the body-centered cubic structure of metals such as iron and tungsten and (d) the total number of octahedral and tetrahedral sites in a unit cell of the body-centered cubic structure. Diffusion paths parallel to the unit cell edges can occur by a series of alternating octahedral and tetrahedral site jumps, dashed line. Figure 5.8 Interstitial diffusion (a) interstitial diffusion involving the direct migration of an interstitial atom to an adjacent site in the crystal (b, c) some of the octahedral and tetrahedral interstitial sites in the body-centered cubic structure of metals such as iron and tungsten and (d) the total number of octahedral and tetrahedral sites in a unit cell of the body-centered cubic structure. Diffusion paths parallel to the unit cell edges can occur by a series of alternating octahedral and tetrahedral site jumps, dashed line.
Interstitial sites are defined as those that would usually be empty in an ideal structure. Occasionally in real structures, ions may be displaced from their lattice sites into interstitial sites Frenkel defect formation). Once this happens, the ions in interstitial sites can often hop into adjacent interstitial sites. These hops may be one stage in a long range conduction process. A schematic example is shown in Fig. 2.1(h) a small number of Na ions are displaced into the tetrahedral interstitial sites and can subsequently hop into adjacent tetrahedral sites. It should be noted, however, that while a small number of Frenkel defects may form in NaCl, conduction is primarily by means of vacancies whereas in some other structures, e.g. AgCl, Frenkel defects do predominate. [Pg.8]

Hydron atoms readily dissolve into bulk Pd, where they can reside in either the sixfold octahedral or fourfold tetrahedral interstitial sites. Determine the classical and zero-point corrected activation energies for H hopping between octahedral and tetrahedral sites in bulk Pd. In calculating the activation energy, you should allow all atoms in the supercell to relax but, to estimate vibrational frequencies, you can constrain all the metal atoms. Estimate the temperature below which tunneling contributions become important in the hopping of H atoms between these two interstitial sites. [Pg.159]

Virtually all of the reported structural data on titanium alloy hydrides and deuterides indicate that the solute atoms occupy tetrahedral interstitial sites in the metal lattice. Neutron diffraction data obtained for deuterium in Ti/34 atom % Zr and in Ti/34 atom % Nb (17) indicate tetrahedral site occupancy in the bcc /3-phase. Similarly, data reported for deuterium in Ti/19 atom % V and in Ti/67 atom % Nb (18) indicate tetrahedral site occupancy in the fee 7-phase. Crystallographic examination of the 7-phase Ti-Nb-H system (19) reveals that increasing niobium content linearly increases the lattice parameter of the fee 7-phase for Nb contents ranging from 0 to 70.2 atom %. Vanadium, on the other hand, exerts the opposite effect (6) at H/M = 1.85, the 7-phase lattice parameter decreases with increasing vanadium contents. [Pg.351]

Point Defects. Point defects are defined as atomic defects. Atomic defects such as metal ions can diffuse through the lattice without involving themselves with lattice atoms or vacancies (Figure 9), in contrast to atomic defects such as self-interstitials. The silicon self-interstitial is a silicon atom that is bonded in a tetrahedral interstitial site. Examples of point defects are shown in Figure 9. [Pg.287]


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See also in sourсe #XX -- [ Pg.597 , Pg.602 ]

See also in sourсe #XX -- [ Pg.597 , Pg.602 ]

See also in sourсe #XX -- [ Pg.59 , Pg.60 ]




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