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Technologies for GaN Surface Emitting Lasers

B1 Optical Gain and Threshold Current Density of GaN-Based VCSELs [Pg.623]

FIGURE 1 The maximum gain of GaN and GaAs as a function of injected carrier density. [Pg.624]

The device diameter defined by the radius of the active region is also a very important parameter for low threshold devices. We have to decrease the diameter to realise a low threshold VCSEL. In [Pg.624]

FIGURE 2 A model of surface emitting lasers considered in this study. [Pg.625]


C5.5 InGaN/GaN laser diodes grown on 6H-SiC C5.6 Technologies for GaN surface emitting lasers C5.7 Role of defects in GaN-based lasers C5.8 GaN-based UV detectors... [Pg.585]

C5.6 Technologies for GaN surface emitting lasers D THRESHOLD CRITERIA... [Pg.630]


See other pages where Technologies for GaN Surface Emitting Lasers is mentioned: [Pg.623]    [Pg.624]    [Pg.625]    [Pg.626]    [Pg.627]    [Pg.628]    [Pg.629]    [Pg.631]    [Pg.623]    [Pg.624]    [Pg.625]    [Pg.626]    [Pg.627]    [Pg.628]    [Pg.629]    [Pg.631]    [Pg.262]    [Pg.589]    [Pg.473]   


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