Target electrode

Extensive (Sample on Target Electrode) Sputter Etching Reactive Sputter Etching Reactive Sputter Etching Reactive Ion Etching... 

The third observation is contained in Table 2 where it can be seen that large amounts of CO, CO2 and COFj are evolved when SiOj is etched (SiOj target) in a pure CF plasma whereas relatively little of these gases is seen when the target electrode... 

In a typical experimental measurement a Nd YAG laser fires a 5 ns pulse on to the target electrode. It is convenient to use a polymeric material for the electrode, made conductive by the addition of conductive carbon black, to achieve intimate contact with the specimen. Adding a thin layer of a volatile liquid to the electrode surface just prior to firing the laser greatly enhances the magnitude of the signal, by helping to increase the size of the pressure pulse... 

In another set of experiments, PBTMSS samples were etched in the reactor which has been configured for sputtering, i.e., with a relatively high RF power (0.8 W/cm ) coupled to the upper target electrode. The wafer potential in this mode is low (80 to 130 V). The resist thickness was reduced by about 800 to 1000 A after 1 min. of such treatment (Figure 1, curve D). However, the surface of the polymer was smooth and defect-free. It was also found that a PBTMSS film pretreated by this method would withstand subsequent standard O2 RIE pattern transfer in a manner similar to the sample pretreated by the high-bias process, i.e., without the formation of surface defects. For convenience this pretreatment process will be referred to as "sputter-mode etching" (SME). 

Simultaneous Plasma Polymerization of an Organic Gas or Vapor and Sputtering or Etching of a Metal from the Target Electrode... 

Electrochemically modulated separations (EMS) is a technique that relies on electrochemical redox adjustment and surface chemistry to effect isolation and accumulation of Pu at a target electrode (Clark et al. 2006 Duckworth et al. 2009). EMS may be a rapid and cost-effective means of performing Pu separations that has implications for DA and NDA, simplifying laboratory separations and allowing NDA for input accountancy tanks. 

One primary difference must be understood in characterizing supercapacitors using the three- and two-electrode cells. The information obtained using the former technique comes solely from the target electrode process without interference from the other electrode. With the latter technique, the information obtained is the sum of contributions from both electrodes. Interference from the second electrode must be subtracted to determine the sole contribution of the target electrode. The information obtained from the threecell technique is ex situ and does not necessarily reflect the real situation. However, it is commonly used for fast screening because it does not require an entire supercapacitor assembly The information obtained from the twocell method is considered in situ or close to the real operating conditions. 

For symmetric supercapacitor systems in which the two electrodes are identical, the information obtained using the two-electrode cell can be easily separated. For example, the obtained capacitance from the whole cell represents only half of the targeted electrode because the entire capacitance can be treated as two identical capacitances connected in series, as described in... 

During CV measurement, the potential of the working or target electrode in the system is measured against the reference electrode via linear scanning back and forth between the specified upper and lower potential limits, as shown in Figure 7.4. The slope of the linear (forward and back) lines is called the potential (E) scan rate (v) ... 

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