Synthetic Routes Involving Deposition and Annealing EDA

The aim of the ED step is to provide a compact, adherent, laterally uniform precursor film with the desired stoichiometry for commercial appHcations, lateral compositional uniformity needs to be guaranteed over large areas. The desired properties can only be obtained if the ED process is properly controlled. The nature of deposited layers depends on electrode material, precursor species in solution, applied potential program, hydrodynamic conditions, and temperature. Eor single metal systems, these factors are well understood. Eor deposition of multiple elements including a chalcogen, the ED process becomes substantially more complex. 

The key challenges facing attempts to electrodeposit chalcogen-containing compounds are summarized below. 

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