SVM Applied to Process Design for Materials Preparation

Although the discovery of new materials is very exciting in materials research, the most part of tasks of materials research everyday is to try to 

1 SVM applied to intelligent control of In20 semiconductor film preparation (problem of thickness control) 

Thickness (nm) Drawing rate Drawing Viscosity In203 content (cm min ) number (centipoise) (%) PVA content (%) 

2 SVM applied to modeling for control of AIN semiconductor film growth (modeling preparation condition for materials with specified structure) 

Aluminium nitride thin film, having 100 or 002 crystal orientation, is useful for piezo-electric devices. The most important factors influencing the crystal orientation are sputtering pressure (Pj), target-base distances (D) and power of operation (W) in preparation process. 

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