Structure and Surface Modification of Porous Silicon

A number of studies has been attempted to stabilize porous silicon low-temperature oxidation in a controlled way [1-3], surface modification of silicon nanocrystallites by chemical [4] or electrochemical [5] procedures etc. Rapid thermal processing (RTP) is thought to be a shortcut method of the PS stabilization for a number of purposes. However, there is no data about RTP influence on the PS structure. Therefore, the study of lattice deformations of PS layers after RTP is of great interest. In the present work. X-ray double-crystal diffractometry was used to measure lattice deformations of PS after RTP of millisecond and second durations. 

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