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Status and Future Developments

In the development of the discussed fluorinated products a lot of fundamental insight has been gained into permeation and adhesion properties of surface-fluorinated polymers. Although this insight is not discussed in this paper, it may be of interest to mention a few significant fundamental discoveries and also to suggest directions for future development. [Pg.257]

It may be possible to predict the permeation characteristics of the fluorinated layer by using the acid-base theory of surface energy together with solubility theory.  [Pg.258]

The role of additives in plastics in the creation of low-permeability fluorinated layers is totally underestimated/ignored in the open literature. [Pg.258]

The conclusion that might be drawn from published results, that adhesive/coating systems adhere just as well to fluorinated and oxfluorinated surfaces, is not supported by our experience based on activation conditions normally encountered in commercial postfluorination plants. [Pg.258]

We have found enough exceptions to refrain from predicting that a specific adhesive system, e.g., epoxy or polyester, will always adhere better to a fluorinated or oxfluorinated surface. [Pg.258]


CELL SAMPLE PREPARATION FOR CLINICAL CYTOPATHOLOGY CURRENT STATUS AND FUTURE DEVELOPMENT... [Pg.219]

Kaufmann, C. Carver, P. (1997). Antifungal agents in the 1990s — current status and future developments. Drugs 53(4), 539-549. [Pg.41]

Buchanan, B.B. 1991. Regulation of CO2 assimilation in oxygenic photosynthesis the ferre-doxin/thioredoxin system. Perspective on its discovery, present status and future development. Arch. Biochem. Biophys.289, 1-9. [Pg.257]

Wedel, G. von, and Hirschfelder, H. LLB Approach Pressurised Circulating Fluidized Bed Combustion Current Status and Future Development, in Circulating Fluidized Bed Technology IV (Amos A. Avidan, ed.), pp. 272-277. Somerset, Pennsylvania (1993). [Pg.80]

Present Status and Future Development of Trace Element Analysis in Nutrition... [Pg.1]

Dongliang, Z. Present status and future development of coal gasification technology in China. Coal Chemical Industry, 2004, 2, 1. [Pg.217]

Tanaka, R. Present Status and Future Development of Research for Advanced Radiation Application Using Fast Ions, Oyo Buturi 2000, 69, 369 (in Japanese) (a monthly publication of The Japan Society of Applied Physics). [Pg.854]

ARl 68 Current status and future development of modular high temperature gas-cooled reactor technology. No. 1198, 11 April 2001. [Pg.257]

Mathe G, Mara] R, De Jagrr R, cds. Anthracydines Current Status and Future Developments. New York Masson Publishing USA. 1981. [Pg.646]

Zbinden C. Cardiotoxicity models. Mach6 G, Maial M, De Jager R, eds. Anthracyclines Current Status and Future Developments. New Yoik Masson Publi ing USA, 1981 49-53. [Pg.649]

Hu, J. Liu, S. Responsive polymers for detection and sensing apphcations current status and future developments. Macromolecules 2010,43, 8315-8330. [Pg.458]

A. F. Low et al., Technology insight Optical coherence tomography-current status and future development. Nature Clinical Practice Cardiovascular Medicine, 3(3), 154-162 (2006). [Pg.628]

Hu, J.andLiu,S. (2010).Responsive Polymers for Detection and SensingAppheations Current Status and Future Developments. Macromolecules, 43,8315-8330. [Pg.83]

INTERNATIONAL ATOMIC ENERGY AGENCY, Current Status and Future Development of Modular High Temperature Gas Cooled Reactor Technology, lAEA-TECDOC-1198, IAEA, Vienna (2001). [Pg.90]

Borthne A, Pierre-Jerome C, Nordshus T, Reiseter T (2000) MR Urography in children current status and future development. Eur Radiol 10 503-511... [Pg.34]

Hermans L. J. F. (1992). Overview on experimental data from Senftleben-Beenakker effects, in Status and Future Developments in the Study of Transport Properties, eds. W.A. Wakeham, A.S. Dickinson, F.R.W. McCourt V. Vesovic, pp. 155-174. Dordrecht Kluwer. [Pg.64]

Snowdon, K.G. Tanner, G.G. Thompson, JR. Lead free soldering electronic interconnect Current status and future developments. Proc. 50th Electron. Comp. Tech. Conf Las Vegas, NV, IEEE Piscataway, NJ, May 2000 1416-1419. [Pg.297]


See other pages where Status and Future Developments is mentioned: [Pg.258]    [Pg.257]    [Pg.855]    [Pg.51]    [Pg.2825]    [Pg.118]    [Pg.257]    [Pg.48]    [Pg.65]    [Pg.1397]   


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