Source inductance

ASIA atomizer, source, inductively coupled plasma in atomic fluorescence... 

A case of no source inductance is included in Figure 2.3, which is shown by the dashed... 

Figure 2.22 shows the effect of source inductance on a statistical distribution of overvoltages. No clear tendency is observed in the figure. 

The effect of the line length is dependent on the source inductance, and the following observations can be made ... 

In the case of source inductances of 50 mH at both ends. Figure 2.29a, the highest maximum overvoltage of 1.56 pu occurs at the middle of the line, and the overvoltage decreases symmetrically toward the ends of the line. The reason for this condition is that positive reflected waves from both ends arrive at the middle of the line at the same instance and are superposed. 

Lj is the source inductance (in most cases, transformer inductance)... 

For example, neglecting the source inductance and the surge impedance [Zq] at the right of node P with the source voltage E = E cos(coot)> following phase b (sound phase) voltage is derived ... 

As described previously, vapour introduction approaches are by far the most common application of atomic fluorescence. Despite this, mention of other methods should be made. If a conventional nebulizer and spray chamber assembly (see AAS section) is used, it is possible to introduce liquid samples directly to the atom cell. In circumstances such as these, it is necessary to use more robust air-acetylene or nitrous oxide-acetylene flame, or perhaps an ICP. The use of an ICP as an atom cell for AFS measurements has led to the development of a number of different techniques, e.g. ASIA, an acronym for atomiser, source, inductively coupled plasmas in AFS. This technique uses a high-powered ICP as a source and a low-powered ICP for the atom cell. It has been found that ICP-AFS yields linear calibrations over 4—6 orders of magnitude and is more sensitive than ICP-AES. 

Included in the figure (--) is the case of no source inductance, which is... 

Plasma source, inductively coupled plasma (ICP) A plasma source where the plasma is formed in a region surrounded by an rf coil that couples energy into the electrons in the plasma. 

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