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Solution-deposited, self-assembled

Another approach in generating molecular insulating layers without the need of chemical conversion after deposition is the use of preliminarily modified molecules which can form dense self-assembled monolayers. To create dense self-assembled monolayers with sufficient robustness and insulating properties, a modified alkyltrichlorosilane with an aromatic end-group (18-phenoxyoctadecyl)tri-chlorosilane (PhO-OTS chemical structure Fig. 6.15a) was synthesized and tested [50]. The SAMs were created in a one-step process from vapor phase or solution. On self-assembly on a natively oxidized silicon surface the n-n interaction between the phenoxy end-groups of adjacent molecules creates an intermolecular top-link, leading to a more closely packed surface compared to monolayer than when linear end groups are used. [Pg.155]

Since multiple electrical and optical functionality must be combined in the fabrication of an OLED, many workers have turned to the techniques of molecular self-assembly in order to optimize the microstructure of the materials used. In turn, such approaches necessitate the incorporation of additional chemical functionality into the molecules. For example, the successive dipping of a substrate into solutions of polyanion and polycation leads to the deposition of poly-ionic bilayers [59, 60]. Since the precursor form of PPV is cationic, this is a very appealing way to tailor its properties. Anionic polymers that have been studied include sulfonatcd polystyrene [59] and sulfonatcd polyanilinc 159, 60]. Thermal conversion of the precursor PPV then results in an electroluminescent blended polymer film. [Pg.223]

Self-assembly of the precursor components in the EISA process starts after evaporation of part of the volatile solvent, which progressively enriches the solution with respect to surfactant, precursor, and water. When their concentration in the deposited him achieves a certain critical level, mesostructure formation takes place. The latter is in equilibrium with the processing atmosphere. So the relative humidity, as well as the temperature during him deposition, represent some of the most important parameters influencing the mesostructure formation. [Pg.288]

Figure 5.25 AFM images of intermediate stmctures in self-assembly of peptide KFE8 in aqueous solution deposited on freshly cleaved mica surface (a) 8 min after preparation of solution. Inset electron micrograph of sample of peptide solution obtained using quick-freeze deep-etch technique (b) 35 min, (c) 2 h, and (d) 30 h after preparation. Reprinted with permission from Ref. 110. Copyright 2002 by the American Chemical Society. Figure 5.25 AFM images of intermediate stmctures in self-assembly of peptide KFE8 in aqueous solution deposited on freshly cleaved mica surface (a) 8 min after preparation of solution. Inset electron micrograph of sample of peptide solution obtained using quick-freeze deep-etch technique (b) 35 min, (c) 2 h, and (d) 30 h after preparation. Reprinted with permission from Ref. 110. Copyright 2002 by the American Chemical Society.

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Self-assembled monolayers solution-phase deposition

Solution self-assembly

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