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SI parameter

The geometry of the hypervalent OMC3X fragment (M = Ge, Si) may be also characterized by the Ail = 2 r — SI parameter, where il is a solid angle formed by equatorial bonds of the central The Ail values for L"MMe2Cl molecules (where L"... [Pg.1049]

All substances have been characterized by common spectroscopic techniques like MS, IR, h, and Si NMR and by elemental analysis. As can be expected, Si NMR spectroscopy turned out to be particularly useful to prove the proposed structures of the oligosilanylsulfanes 1-12. Selected Si parameters are depicted in Table 1. [Pg.123]

New Si Parameters for Molecular Mechanics Obtained from Ab Initio Computations. ... [Pg.426]

Another interesting aspect of n —CO chemistry is the bonding. As will be described in this section, the most common situation is to regard II —CO as a formal four-electron donor. However, some CO ligands that ostensibly have the II —CO geometry are best described as two-electron donors and others as six-electron donors. The SI parameter ranges from approximately 2.2 to 3.3 for n —CO compounds (Fig. 4). [Pg.268]

As illustrated in Fig. 5.7, the difference ofthe values of the function at the minima in0 = — 7t/2and0 = +7t/2is given by twice the value ofthe Si parameter. [Pg.196]

The feed-and-bleed function for beyond-design-basis events is performed by the use of the Safety Depressurization System (SDS) in conjunction with the Safety Injection System (SIS) as described in CESSAR-DC, Section 6.7. The PAMI also monitors and displays SDS and SIS parameters following initiation of feed-and-bleed. [Pg.178]

The first quantum mechanical improvement to MNDO was made by Thiel and Voityuk [19] when they introduced the formalism for adding d-orbitals to the basis set in MNDO/d. This formalism has since been used to add d-orbitals to PM3 to give PM3-tm and to PM3 and AMI to give PM3(d) and AMl(d), respectively (aU three are available commercially but have not been published at the time of writing). Voityuk and Rosch have published parameters for molybdenum for AMl(d) [20] and AMI has been extended to use d-orbitals for Si, P, S and Q. in AMI [21]. Although PM3, for instance, was parameterized with special emphasis on hypervalent compounds but with only an s,p-basis set, methods such as MNDO/d or AMI, that use d-orbitals for the elements Si-Cl are generally more reliable. [Pg.383]

The accuracy of a molecular mechanics or seim-eni pineal quantum mechanics method depends on the database used to parameterize the method. This is true for the type of molecules and the physical and chemical data in the database. Frequently, these methods give the best results for a limited class of molecules or phen omen a. A disad van tage of these methods is that you m u si have parameters available before running a calculation. Developing param eiers is time-consuming. [Pg.21]

Witir the correct choice of the parameters k and the ah initio data in Figure 4.50 could be reproduced very well. In this force field a Urey-Bradley term was also included between the silicon atoms in such angles to model the lengthening of the Si—O bond as the angle decreased. [Pg.255]

These are the only differences between the MNDO and AMI functional form. Dewar s group regenerated AMI parameters for the elements H, B, C, N, 0, F, Al, Si, P, S, Cl, Zn, Ge, Br, and Sn and found that the main gains in AMI over MNDO were the ability to reproduce hydrogen bonds and the promise of better activation energies for reactions. AMI does not significantly change the computation time compared with MNDO. [Pg.294]

The situation is not so simple when these various parameters are time dependent. In the latter case, the moduli, designated by E(t)and G(t), are evaluated by examining the (time dependent) value of o needed to maintain a constant strain 7o- By constrast, the time-dependent compliances D(t) and J(t)are determined by measuring the time-dependent strain associated with a constant stress Oq. Thus whether the deformation mode is tension or shear, the modulus is a measure of the stress required to produce a unit strain. Likewise, the compliance is a measure of the strain associated with a unit stress. As required by these definitions, the units of compliance are the reciprocals of the units of the moduli m in the SI system. [Pg.157]

Viscosity is equal to the slope of the flow curve, Tf = dr/dj. The quantity r/y is the viscosity Tj for a Newtonian Hquid and the apparent viscosity Tj for a non-Newtonian Hquid. The kinematic viscosity is the viscosity coefficient divided by the density, ly = tj/p. The fluidity is the reciprocal of the viscosity, (j) = 1/rj. The common units for viscosity, dyne seconds per square centimeter ((dyn-s)/cm ) or grams per centimeter second ((g/(cm-s)), called poise, which is usually expressed as centipoise (cP), have been replaced by the SI units of pascal seconds, ie, Pa-s and mPa-s, where 1 mPa-s = 1 cP. In the same manner the shear stress units of dynes per square centimeter, dyn/cmhave been replaced by Pascals, where 10 dyn/cm = 1 Pa, and newtons per square meter, where 1 N/m = 1 Pa. Shear rate is AH/AX, or length /time/length, so that values are given as per second (s ) in both systems. The SI units for kinematic viscosity are square centimeters per second, cm /s, ie, Stokes (St), and square millimeters per second, mm /s, ie, centistokes (cSt). Information is available for the official Society of Rheology nomenclature and units for a wide range of rheological parameters (11). [Pg.167]

Table 3. Typical Optoelectronic Parameters Obtained for Si H(F) Alloys... Table 3. Typical Optoelectronic Parameters Obtained for Si H(F) Alloys...
The optoelectronic properties of the i -Si H films depend on many deposition parameters such as the pressure of the gas, flow rate, substrate temperature, power dissipation in the plasma, excitation frequency, anode—cathode distance, gas composition, and electrode configuration. Deposition conditions that are generally employed to produce device-quahty hydrogenated amorphous Si (i -SiH) are as follows gas composition = 100% SiH flow rate is high, --- dO cm pressure is low, 26—80 Pa (200—600 mtorr) deposition temperature = 250° C radio-frequency power is low, <25 mW/cm and the anode—cathode distance is 1-4 cm. [Pg.359]

Another parameter of relevance to some device appHcations is the absorption characteristics of the films. Because the k quantum is no longer vaUd for amorphous semiconductors, i -Si H exhibits a direct band gap (- 1.70 eV) in contrast to the indirect band gap nature in crystalline Si. Therefore, i -Si H possesses a high absorption coefficient such that to fully absorb the visible portion of the sun s spectmm only 1 p.m is required in comparison with >100 fim for crystalline Si Further improvements in the material are expected to result from a better understanding of the relationship between the processing conditions and the specific chemical reactions taking place in the plasma and at the surfaces which promote film growth. [Pg.360]

Units employed in diffusivity correlations commonly followed the cgs system. Similarly, correlations for mass transfer correlations used the cgs or Enghsh system. In both cases, only the most recent correlations employ SI units. Since most correlations involve other properties and physical parameters, often with mixed units, they are repeated here as originally stated. Common conversion factors are listed in Table 1-4. [Pg.588]

SI Number Parameter Overall range (mg/liter except as indicated)... [Pg.2255]


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See also in sourсe #XX -- [ Pg.122 ]




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Transport Parameters of a-Si

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