Scanning probe microscopy automated

This paper describes ongoing studies of the electrodeposition thin films of the compound semiconductors CdTe and InAs, using the method of electrochemical atomic layer epitaxy (ALE). Surface limited electrochemical reactions are used to form the individual atomic layers of the component elements. An automated electrochemical flow deposition system is used to form the atomic layers in a cycle. Studies of the conditions needed to optimize the deposition processes are underway. The deposits were characterized using X-ray diffraction, scanning probe microscopy, electron probe microanalysis and optical/infrared absorption spectroscopy. [Pg.272]

Among the variety of micro-analytical techniques used, electron probe X-ray micro-analysis (EPXMA) and computer controlled scanning electron microscopy with energy-dispersive X-ray detection (CC-SEM/EDX) are most commonly used. Both can be used in fully automated mode, and in combination with cluster analysis and/or multivariate techniques. They are ideally suited for the analysis of representative numbers (300-1000... [Pg.123]