Sampling, artifacts nonuniform

Any sampling scheme, whether uniform or nonuniform, can be characterized by its effective bandwidth, dynamic range, resolution, sensitivity, and number of samples. Some of these metrics are closely related, and it is not possible to optimize all of them simultaneously. For example, minimizing the total number of samples (and thus the experiment time) invariably increases the magnitude of sampling artifacts. Furthermore, a sampling scheme that is optimal for one signal will not necessarily... 

To avoid artifacts created by, for example, differential sputtering rates, Wucher et al. developed protocols for 3D molecular imaging [394]. A procedure for establishing correct depth scales in samples with nonuniform... 

If the sample is an insulator there are still methods by which it can be studied in the instrument. The simplest approach is to coat it with a thin (10-nm) conducting film of carbon, gold, or some other metal. In following this approach, care must be taken to avoid artifacts and distortions that could be produced by nonuniform coatings or by agglomeration of the coating material. If an X-ray analysis is to be... 

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