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Rotatable metal atom reactor

Figure 4. Schematic of a rotatable metal atom reactor for dual electron beam vaporization and cocondensation or liquid phase reaction. Figure 4. Schematic of a rotatable metal atom reactor for dual electron beam vaporization and cocondensation or liquid phase reaction.
Figure 8. Rotatable metal atom reactor for conducting liquid phase metal atom induced polymerizations of organic monomers. Figure 8. Rotatable metal atom reactor for conducting liquid phase metal atom induced polymerizations of organic monomers.
Figure 5b. Rotatable cold finger photochemical metal atom reactor (after Billups et al. [30]). Figure 5b. Rotatable cold finger photochemical metal atom reactor (after Billups et al. [30]).
Fig. 10.1 Metal atom reactor. A - Glass reaction vessel. B - Electron beam furnace, model EBSl, G.V. Planer Ltd. C - Vapour beam of metal atoms. D - Co-condensate of metal and substrate vapours. E - Heat shield. F - Furnace cooling water pipes. G - Electrical lead for substrate solution dispersion device. H - Furnace electrical leads. J - Substrate inlet pipe (vapour). K - Substrate inlet pipes (solution). M - Rotation of reaction vessel. N - To vacuum rotating seal, service vacuum lead troughs and pumping systems. 0-Level of coolant (usually liquid nitrogen). P-Capped joint for product extraction. 0-Substrate vapour dispersion device. R-Substrate vapour beam. (From Green, M.L.H., 1980, /. Organomet. Chem., 300, 119.)... Fig. 10.1 Metal atom reactor. A - Glass reaction vessel. B - Electron beam furnace, model EBSl, G.V. Planer Ltd. C - Vapour beam of metal atoms. D - Co-condensate of metal and substrate vapours. E - Heat shield. F - Furnace cooling water pipes. G - Electrical lead for substrate solution dispersion device. H - Furnace electrical leads. J - Substrate inlet pipe (vapour). K - Substrate inlet pipes (solution). M - Rotation of reaction vessel. N - To vacuum rotating seal, service vacuum lead troughs and pumping systems. 0-Level of coolant (usually liquid nitrogen). P-Capped joint for product extraction. 0-Substrate vapour dispersion device. R-Substrate vapour beam. (From Green, M.L.H., 1980, /. Organomet. Chem., 300, 119.)...
The rotatable reactor can also be used for reactions in fluids having suitably low (< 10"3 Torr) vapor pressure. In this mode, metal atoms are evaporated upwards into the cold liquid, which is spun as a thin band on the inner surface of the flask. Reactions with dissolved polymers can then be studied. Specially designed electron gun sources can be operated, without static discharge, under these potentially high organic vapor pressure conditions (6). Run-to-nin reproducibility is obtained by monitoring the metal atom deposition rate with a quartz crystal mass balance (thickness monitor). [Pg.243]

Figure 1. Dual electron gun rotatable reactor for condensed phase metal atom synthesis. Figure 1. Dual electron gun rotatable reactor for condensed phase metal atom synthesis.

See other pages where Rotatable metal atom reactor is mentioned: [Pg.332]    [Pg.335]    [Pg.332]    [Pg.335]    [Pg.58]    [Pg.243]    [Pg.181]    [Pg.479]    [Pg.121]    [Pg.121]    [Pg.49]    [Pg.121]    [Pg.229]    [Pg.200]   
See also in sourсe #XX -- [ Pg.184 ]




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