Resolution enhancement techniques

DQ coherence between C (,-) and C m and then let the DQ coherence evolve under the influence of the heteronuclear I3C-15N dipole-dipole interaction [181, 182]. The virtue of this design is that it can be easily combined with other resolution enhancement technique such as INADEQUATE [183]. Alternatively, the magnetization of C (,) dephased under the 13C-15N dipolar coupling can be transferred to C (j) for another period of 13C-15N dipolar dephasing [183]. This idea can be combined with the NCOCA experiment so that the superior resolution provided by the C (,-)-N(j+i) correlation could be exploited. The overall efficiency, however, is relatively low due to the use of two polarization-transfer steps, viz. 15N —> 13C and 13C —> 13C [183]. In comparison with the techniques, the advan-... 

Shibuya, M. Resolution enhancement techniques for optical lithography and optical imaging theory. Optical Review 1997, 4, 151-160. 

Resolution enhancement techniques" may give IR an advantage over CD in distinguishing fine differences in structure. For example, the X-ray structure of the Ca " " binding protein a-lactalbumin contains both relatively long stretches of 3io-helix and normal a-helices. FTIR spectra of a-lactalbumin in D2O show a band at 1639 cm 1 that is probably attributable to the 3io-helices as well as bands at 1651... 

Two mathematical methods, derivative spectroscopy and Fourier selfdeconvolution (FSD), have been found to be extremely useful in identifying the location of overlapping bands. The mathematical principles of these "resolution enhancement" techniques are described in references [3] and [4]. 

K. Roth, "A Simple resolution enhancement technique Delayed Fourier transformation, J. Magn. Resonance 38, 65-70 (1980). 

ANTI-REFLECTION (1990s) (1980) RESOLUTION ENHANCEMENT TECHNIQUES... 

K. Wong, Resolution Enhancement Techniques in Optical Lithography, p. 14, SPIE Press, Bellingham, WA (2001). 

Levinson, Principles of Lithography, 2nd ed., p. 243, SPIE Press, Bellingham, WA (2005). A.K. K. Wong, Resolution Enhancement Techniques in Optical Lithography, 2nd ed., p. 10, SPIE Press, Bellingham, WA (2001). 

In general, the single-exposure techniques rely on the use of either hyper-NA >1.0 as implemented in immersion lithography (see Chapter 13) or exposure wavelength reduction as implemented in EUV lithography (see Chapter 14) and electron-beam lithography (see Chapter 15). These techniques may be complemented with reticle-based resolution-enhancement techniques such as phase-shifting masks and the like. 

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