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Resist time, developer plus

Chemical and Electrochemical Corrosion of Pile Materials Under Radiation, Since uranium is readily oxidized, it must be protected from the water by a sheath or coating. Also, for the external cooling, a lining tube must be placed in the graphite. With water as the coolant, these two (the sheath and tube) must be of the same material or of two materials close together in the electrochemical series to suppress electrochemical corrosion. Of the few suitable materials, which have low danger coefficients and are not attacked appreciably by hot water, etc., the most promising are, in order, beryllium and aluminimn. While the former is more desirable also for its hardness and resistance to wear, the limited supply of beryllium available plus the lack of commercial development make aluminium with its more extensive commercial production and development practically the only alternative, imtil such time as beryllium or beryllium-aluminimn alloys can compete or surpass aluminium or unless further corrosion tests prohibit the use of aluminium and force the development of Be or Be-Al. [Pg.313]

The latest innovation is the further development of the material to produce the new Ceran Suprema glass-ceramic cooktop panel. Optimization of the composition of the material plus a new manufacturing process resulted in a further improvement of the heat transmission and temperature resistance of the glass ceramic. In consequence, built-in radiant heating elements can now be adjusted to higher cooking zone temperatures. And boil-up time, depending on the cookware used, can be as much as 20% less (see also Sect. 3.2.3). [Pg.54]


See other pages where Resist time, developer plus is mentioned: [Pg.116]    [Pg.31]    [Pg.238]    [Pg.775]    [Pg.165]    [Pg.277]    [Pg.223]    [Pg.2271]    [Pg.65]    [Pg.304]    [Pg.619]    [Pg.24]    [Pg.222]    [Pg.940]    [Pg.14]    [Pg.255]    [Pg.395]    [Pg.403]    [Pg.163]    [Pg.200]    [Pg.237]    [Pg.163]    [Pg.286]    [Pg.281]    [Pg.321]   


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Development time

Resist development

Resistance development

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