Raman microprobe contamination

Figure 3-8 Raman microprobe spectrum of fluorinated hydrocarbon contaminant on silicon wafer that had been polished and plasma-etched (lower) and Raman spectrum of polytetrafluoro-ethylene (upper). Laser, 135 mW at 514.5 nm. Slits, 300 jon. Time, 0.5 s per data point. (Reproduced with permission from Adar, F., in Microelectronics Processing Inorganic Materials Characterization (L. A. Casper, ed.), ACS Symposium Series Vol. 295, pp. 230-239. American Chemical Society, Washington, D.C., 1986. Copyright 1986 American Chemical Society.)...

Initial experiments on DLC were conducted with Raman microprobes however, the opportunity afforded by the application of Raman spectroscopy for the measurement of DLC film properties have led to a number of instrument companies introducing nonmicroscope-based analyzers tailored specifically for this market. Raman microscope systems are currently extensively used in the area of failure analysis. In this application, the high spatial resolution obtainable with a Raman microprobe is useful for the identification of small defects and contaminants. 

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