Radio frequency glow discharge method

The radio-frequency glow-discharge method [30-34] has been the most used method in the study of a-C H films. In this chapter, it is referred to as RFPECVD (radio frequency plasma enhanced chemical vapor deposition). Film deposition by RFPECVD is usually performed in a parallel-plate reactor, as shown in Figure 1. The plasma discharge is established between an RF-powered electrode and the other one, which is maintained at ground potential. The hydrocarbon gas or vapor is fed at a controlled flow to the reactor, which is previously evacuated to background pressures below lO"" Torr. The RF power is fed to the substrate electrode... 

This chapter deals exclusively with the methods that have been developed for the direct solids analysis of nonconductive samples by glow discharge mass spectrometry. The basic approaches to operation and sample preparation for the three primary methodologies of compaction, secondary cathode, and radio frequency powering are described. Examples of source performance and practical applications of each are taken from the analytical literature. Whereas this chapter de-... 

Plasma polymerization of aniline in the absence of a solvent or a chemical oxidant, giving neutral undoped PAn, was first described in 1984.110 This method has been further developed111112 recently with, for example, Cruz and coworkers, describing the deposition of PAn film using radio frequency (RF) glow discharges between stainless steel electrodes and at 0.02-0.08 atm pressures. The aniline monomer reacts with electrons in the plasma, and the polymer deposits on the reactor wall after growth.100... 

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